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Aluminum scandium nitride (AlScN) has emerged as a highly promising material for high-temperature applications due to its robust piezoelectric, ferroelectric, and dielectric properties. This study investigates the behavior of Al0.7Sc0.3N thin films in extreme thermal environments, demonstrating functional stability up to 1000\degC, making it suitable for use in aerospace, hypersonics, deep-well, and nuclear reactor systems. Tantalum silicide (TaSi2)/Al0.7Sc0.3N/TaSi2 capacitors were fabricated and characterized across a wide temperature range, revealing robust ferroelectric and dielectric properties, along with significant enhancement in piezoelectric performance. At 1000\degC, the ferroelectric hysteresis loops showed a substantial reduction in coercive field from 4.3 MV/cm to 1.2 MV/cm, while the longitudinal piezoelectric coefficient increased nearly tenfold, reaching 75.1 pm/V at 800\degC. Structural analysis via scanning and transmission electron microscopy confirmed the integrity of the TaSi2/Al0.7Sc0.3N interfaces, even after exposure to extreme temperatures. Furthermore, the electromechanical coupling coefficient was calculated to increase by over 500%, from 12.9% at room temperature to 82% at 700\degC. These findings establish AlScN as a versatile material for high-temperature ferroelectric, piezoelectric, and dielectric applications, offering unprecedented thermal stability and functional enhancement.

The incorporation of rare-earth elements in wurtzite nitride semiconductors, e.g., scandium alloyed aluminum nitride (ScAlN), promises dramatically enhanced piezoelectric responses, critical to a broad range of acoustic, electronic, photonic, and quantum devices and applications. Experimentally, however, the measured piezoelectric responses of nitride semiconductors are far below what theory has predicted. Here, we show that the use of a simple, scalable, post-growth thermal annealing process can dramatically boost the piezoelectric response of ScAlN thin films. We achieve a remarkable 3.5-fold increase in the piezoelectric modulus, d33 for 30% Sc content ScAlN, from 12.3 pC/N in the as-grown state to 45.5 pC/N, which is eight times larger than that of AlN. The enhancement in piezoelectricity has been unambiguously confirmed by three separate measurement techniques. Such a dramatic enhancement of d33 has been shown to impact the effective electromechanical coupling coefficient kt2 : increasing it from 13.8% to 76.2%, which matches the highest reported values in millimeter thick lithium niobate films but is achieved in a 100 nm ScAlN with a 10,000 fold reduction in thickness, thus promising extreme frequency scaling opportunities for bulk acoustic wave resonators for beyond 5G applications. By utilizing a range of material characterization techniques, we have elucidated the underlying mechanisms for the dramatically enhanced piezoelectric responses, including improved structural quality at the macroscopic scale, more homogeneous and ordered distribution of domain structures at the mesoscopic scale, and the reduction of lattice parameter ratio (c/a) for the wurtzite crystal structure at the atomic scale. Overall, the findings present a simple yet highly effective pathway that can be extended to other material families to further enhance their piezo responses.

Topology and superconductivity, two distinct phenomena offer unique insight into quantum properties and their applications in quantum technologies, spintronics, and sustainable energy technologies if system can be found where they coexist. Tin (Sn) plays a pivotal role here as an element due to its two structural phases, $\alpha$-Sn and $\beta$-Sn, exhibiting topological characteristics ($\alpha$-Sn) and superconductivity ($\beta$-Sn). In this study we show how precise control of $\alpha$ and $\beta$ phases of Sn thin films can be achieved by using molecular beam epitaxy grown buffer layers with systematic control over the lattice parameter. The resulting Sn films showed either $\beta$-Sn or $\alpha$-Sn phases as the lattice constant of the buffer layer was varied from 6.10 A to 6.48 A, covering the range between GaSb (closely matched to InAs) and InSb. The crystal structures of the $\alpha$- and $\beta$-Sn films were characterized by x-ray diffraction and confirmed by Raman spectroscopy and scanning transmission electron microscopy. The smooth and continuous surface morphology of the Sn films was validated using atomic force microscopy. The characteristics of $\alpha$- and $\beta$-Sn phases were further verified using electrical transport measurements by observing resistance drop near 3.7 K for superconductivity of the $\beta$-Sn phase and Shubnikov-de Haas oscillations for the $\alpha$-Sn phase. Density functional theory calculations showed that the stability of the Sn phases is highly dependent on lattice strain, with $\alpha$-Sn being more stable under tensile strain and $\beta$-Sn becoming favorable under compressive strain, which is in good agreement with experimental observations. Hence, this study sheds light on controlling Sn phases through lattice engineering, enabling innovative applications in quantum technologies and beyond.