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Probing edge state conductance in ultra-thin topological insulator films
Authors:
Arthur Leis,
Michael Schleenvoigt,
Kristof Moors,
Helmut Soltner,
Vasily Cherepanov,
Peter Schüffelgen,
Gregor Mussler,
Detlev Grützmacher,
Bert Voigtländer,
Felix Lüpke,
F. Stefan Tautz
Abstract:
Quantum spin Hall (QSH) insulators have unique electronic properties, comprising a band gap in their two-dimensional interior and one-dimensional spin-polarized edge states in which current flows ballistically. In scanning tunneling microscopy (STM), the edge states manifest themselves as a localized density of states. However, there is a significant research gap between the observation of edge st…
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Quantum spin Hall (QSH) insulators have unique electronic properties, comprising a band gap in their two-dimensional interior and one-dimensional spin-polarized edge states in which current flows ballistically. In scanning tunneling microscopy (STM), the edge states manifest themselves as a localized density of states. However, there is a significant research gap between the observation of edge states in nanoscale spectroscopy, and the detection of ballistic transport in edge channels which typically relies on transport experiments with microscale lithographic contacts. Here, we study few-layer films of the three-dimensional topological insulator (Bi$_{x}$Sb$_{1-x})_2$Te$_3$, for which a topological transition to a two-dimensional topological QSH insulator phase has been proposed. Indeed, an edge state in the local density of states is observed within the band gap. Yet, in nanoscale transport experiments with a four-tip STM, 2 and 3 quintuple layer films do not exhibit a ballistic conductance in the edge channels. This demonstrates that the detection of edge states in spectroscopy can be misleading with regard to the identification of a QSH phase. In contrast, nanoscale multi-tip transport experiments are a robust method for effectively pinpointing ballistic edge channels, as opposed to trivial edge states, in quantum materials.
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Submitted 7 April, 2022;
originally announced April 2022.
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Nanoscale tip positioning with a multi-tip scanning tunneling microscope using topography images
Authors:
A. Leis,
V. Cherepanov,
B. Voigtländer,
F. S. Tautz
Abstract:
Multi-tip scanning tunneling microscopy (STM) is a powerful method to perform charge transport measurements at the nanoscale. With four STM tips positioned on the surface of a sample, four-point resistance measurements can be performed in dedicated geometric configurations. Here, we present an alternative to the most often used scanning electron microscope (SEM) imaging to infer the corresponding…
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Multi-tip scanning tunneling microscopy (STM) is a powerful method to perform charge transport measurements at the nanoscale. With four STM tips positioned on the surface of a sample, four-point resistance measurements can be performed in dedicated geometric configurations. Here, we present an alternative to the most often used scanning electron microscope (SEM) imaging to infer the corresponding tip positions. After initial coarse positioning monitored by an optical microscope, STM scanning itself is used to determine the inter-tip distances. A large STM overview scan serves as a reference map. Recognition of the same topographic features in the reference map and in small scale images with the individual tips allows to identify the tip positions with an accuracy of about 20 nm for a typical tip spacing of ~1 $μ$m. In order to correct for effects like the non-linearity of the deflection, creep and hysteresis of the piezo-electric elements of the STM, a careful calibration has to be performed.
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Submitted 27 January, 2022;
originally announced January 2022.
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Lifting the spin-momentum locking in ultra-thin topological insulator films
Authors:
Arthur Leis,
Michael Schleenvoigt,
Vasily Cherepanov,
Felix Lüpke,
Peter Schüffelgen,
Gregor Mussler,
Detlev Grützmacher,
Bert Voigtländer,
F. Stefan Tautz
Abstract:
Three-dimensional (3D) topological insulators (TIs) are known to carry 2D Dirac-like topological surface states in which spin-momentum locking prohibits backscattering. When thinned down to a few nanometers, the hybridization between the topological surface states at the top and bottom surfaces results in a topological quantum phase transition, which can lead to the emergence of a quantum spin Hal…
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Three-dimensional (3D) topological insulators (TIs) are known to carry 2D Dirac-like topological surface states in which spin-momentum locking prohibits backscattering. When thinned down to a few nanometers, the hybridization between the topological surface states at the top and bottom surfaces results in a topological quantum phase transition, which can lead to the emergence of a quantum spin Hall phase. Here, we study the thickness-dependent transport properties across the quantum phase transition on the example of (Bi$_{0.16}$Sb$_{0.84}$)$_2$Te$_3$ films, with a four-tip scanning tunnelling microscope. Our findings reveal an exponential drop of the conductivity below the critical thickness. The steepness of this drop indicates the presence of spin-conserving backscattering between the top and bottom surface states, effectively lifting the spin-momentum locking and resulting in the opening of a gap at the Dirac point. Our experiments provide crucial steps towards the detection of quantum spin Hall states in transport measurements.
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Submitted 11 June, 2021;
originally announced June 2021.
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Strong and Weak Three-Dimensional Topological Insulators Probed by Surface Science Methods
Authors:
Markus Morgenstern,
Christian Pauly,
Jens Kellner,
Marcus Liebmann,
Marco Pratzer,
Gustav Bihlmayer,
Markus Eschbach,
Lukacz Plucinski,
Sebastian Otto,
Bertold Rasche,
Michael Ruck,
Manuel Richter,
Sven Just,
Felix Luepke,
Bert Voigtlaender
Abstract:
We review the contributions of surface science methods to discover and improve 3D topological insulator materials, while illustrating with examples from our own work. In particular, we demonstrate that spin-polarized angular-resolved photoelectron spectroscopy is instrumental to evidence the spin-helical surface Dirac cone, to tune its Dirac point energy towards the Fermi level, and to discover no…
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We review the contributions of surface science methods to discover and improve 3D topological insulator materials, while illustrating with examples from our own work. In particular, we demonstrate that spin-polarized angular-resolved photoelectron spectroscopy is instrumental to evidence the spin-helical surface Dirac cone, to tune its Dirac point energy towards the Fermi level, and to discover novel types of topological insulators such as dual ones or switchable ones in phase change materials. Moreover, we introduce procedures to spatially map potential fluctuations by scanning tunneling spectroscopy and to identify topological edge states in weak topological insulators.
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Submitted 2 February, 2020;
originally announced February 2020.
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Parasitic conduction channels in topological insulator thin films
Authors:
Sven Just,
Felix Lüpke,
Vasily Cherepanov,
F. Stefan Tautz,
Bert Voigtländer
Abstract:
Thin films of topological insulators (TI) usually exhibit multiple parallel conduction channels for the transport of electrical current. Beside the topologically protected surface states (TSS), parallel channels may exist, namely the interior of the not-ideally insulating TI film, the interface layer to the substrate, and the substrate itself. To be able to take advantage of the auspicious transpo…
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Thin films of topological insulators (TI) usually exhibit multiple parallel conduction channels for the transport of electrical current. Beside the topologically protected surface states (TSS), parallel channels may exist, namely the interior of the not-ideally insulating TI film, the interface layer to the substrate, and the substrate itself. To be able to take advantage of the auspicious transport properties of the TSS, the influence of the parasitic parallel channels on the total current transport has to be minimized. Because the conductivity of the interior (bulk) of the thin TI film is difficult to access by measurements, we propose here an approach for calculating the mobile charge carrier concentration in the TI film. To this end, we calculate the near-surface band bending using parameters obtained experimentally from surface-sensitive measurements, namely (gate-dependent) four-point resistance measurements and angle-resolved photoelectron spectroscopy (ARPES). While in most cases another parameter in the calculations, i.e. the concentration of unintentional dopants inside the thin TI film, is unknown, it turns out that in the thin-film limit the band bending is largely independent of the dopant concentration in the film. Thus, a well-founded estimate of the total mobile charge carrier concentration and the conductivity of the interior of the thin TI film proves possible. Since the interface and substrate conductivities can be measured by a four-probe conductance measurement prior to the deposition of the TI film, the total contribution of all parasitic channels, and therefore also the contribution of the vitally important TSS, can be determined reliably.
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Submitted 6 April, 2020; v1 submitted 25 August, 2019;
originally announced August 2019.
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Surface structures of tellurium on Si(111)-(7x7) studied by low-energy electron diffraction and scanning tunneling microscopy
Authors:
Felix Lüpke,
Jiří Doležal,
Vasily Cherepanov,
Ivan Ošt'ádal,
F. Stefan Tautz,
Bert Voigtländer
Abstract:
The Te-covered Si(111) surface has received recent interest as a template for the epitaxy of van der Waals (vdW) materials, e.g. Bi$_2$Te$_3$. Here, we report the formation of a Te buffer layer on Si(111)$-$(7$\times$7) by low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). While deposition of several monolayer (ML) of Te on the Si(111)$-$(7$\times$7) surface at room te…
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The Te-covered Si(111) surface has received recent interest as a template for the epitaxy of van der Waals (vdW) materials, e.g. Bi$_2$Te$_3$. Here, we report the formation of a Te buffer layer on Si(111)$-$(7$\times$7) by low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). While deposition of several monolayer (ML) of Te on the Si(111)$-$(7$\times$7) surface at room temperature results in an amorphous Te layer, increasing the substrate temperature to $770\rm\,K$ results in a weak (7$\times$7) electron diffraction pattern. Scanning tunneling microscopy of this surface shows remaining corner holes from the Si(111)$-$(7$\times$7) surface reconstruction and clusters in the faulted and unfaulted halves of the (7$\times$7) unit cells. Increasing the substrate temperature further to $920\rm\,K$ leads to a Te/Si(111)$-(2\sqrt3\times2\sqrt{3})\rm R30^{\circ}$ surface reconstruction. We find that this surface configuration has an atomically flat structure with threefold symmetry.
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Submitted 12 October, 2018;
originally announced October 2018.
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Low Vibration Laboratory with a Single-Stage Vibration Isolation for Microscopy Applications
Authors:
Bert Voigtländer,
Peter Coenen,
Vasily Cherepanov,
Peter Borgens,
Thomas Duden,
F. Stefan Tautz
Abstract:
The construction and the vibrational performance of a low vibration laboratory for microscopy applications comprising a 100 ton floating foundation supported by passive pneumatic isolators (air springs), which rest themselves on a 200 ton solid base plate is discussed. The optimization of the air spring system lead to a vibration level on the floating floor below that induced by an acceleration of…
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The construction and the vibrational performance of a low vibration laboratory for microscopy applications comprising a 100 ton floating foundation supported by passive pneumatic isolators (air springs), which rest themselves on a 200 ton solid base plate is discussed. The optimization of the air spring system lead to a vibration level on the floating floor below that induced by an acceleration of 10 ng for most frequencies. Additional acoustic and electromagnetic isolation is accomplished by a room-in-room concept.
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Submitted 15 February, 2018;
originally announced February 2018.
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Four-point probe measurements using current probes with voltage feedback to measure electric potentials
Authors:
F. Lüpke,
D. Cuma,
S. Korte,
V. Cherepanov,
B. Voigtländer
Abstract:
We present a four-point probe resistance measurement technique which uses four equivalent current measuring units, resulting in minimal hardware requirements and corresponding sources of noise. Local sample potentials are measured by a software feedback loop which adjusts the corresponding tip voltage such that no current flows to the sample. The resulting tip voltage is then equivalent to the sam…
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We present a four-point probe resistance measurement technique which uses four equivalent current measuring units, resulting in minimal hardware requirements and corresponding sources of noise. Local sample potentials are measured by a software feedback loop which adjusts the corresponding tip voltage such that no current flows to the sample. The resulting tip voltage is then equivalent to the sample potential at the tip position. We implement this measurement method into a multi-tip scanning tunneling microscope setup such that potentials can also be measured in tunneling contact, allowing in principle truly non-invasive four-probe measurements. The resulting measurement capabilities are demonstrated for BiSbTe$_3$ and Si$(111)-(7\times7)$ samples.
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Submitted 13 December, 2017; v1 submitted 7 September, 2017;
originally announced September 2017.
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Si(111) strained layers on Ge(111): evidence for c(2x4) domains
Authors:
R. Zhachuk,
J. Coutinho,
A. Dolbak,
V. Cherepanov,
B. Voigtländer
Abstract:
The tensile strained Si(111) layers grown on top of Ge(111) substrates are studied by combining scanning tunneling microscopy, low energy electron diffraction and first-principles calculations. It is shown that the layers exhibit c(2x4) domains, which are separated by domain walls along <-110> directions. A model structure for the c(2x4) domains is proposed, which shows low formation energy and go…
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The tensile strained Si(111) layers grown on top of Ge(111) substrates are studied by combining scanning tunneling microscopy, low energy electron diffraction and first-principles calculations. It is shown that the layers exhibit c(2x4) domains, which are separated by domain walls along <-110> directions. A model structure for the c(2x4) domains is proposed, which shows low formation energy and good agreement with the experimental data. The results of our calculations suggest that Ge atoms are likely to replace Si atoms with dangling bonds on the surface (rest-atoms and adatoms), thus significantly lowering the surface energy and inducing the formation of domain walls. The experiments and calculations demonstrate that when surface strain changes from compressive to tensile, the (111) reconstruction converts from dimer-adatom-stacking fault-based to adatom-based structures.
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Submitted 1 September, 2017;
originally announced September 2017.
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Electrical resistance of individual defects at a topological insulator surface
Authors:
Felix Lüpke,
Markus Eschbach,
Tristan Heider,
Martin Lanius,
Peter Schüffelgen,
Daniel Rosenbach,
Nils von den Driesch,
Vasily Cherepanov,
Gregor Mussler,
Lukasz Plucinski,
Detlev Grützmacher,
Claus M. Schneider,
Bert Voigtländer
Abstract:
Three-dimensional topological insulators host surface states with linear dispersion, which manifest as a Dirac cone. Nanoscale transport measurements provide direct access to the transport properties of the Dirac cone in real space and allow the detailed investigation of charge carrier scattering. Here, we use scanning tunnelling potentiometry to analyse the resistance of different kinds of defect…
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Three-dimensional topological insulators host surface states with linear dispersion, which manifest as a Dirac cone. Nanoscale transport measurements provide direct access to the transport properties of the Dirac cone in real space and allow the detailed investigation of charge carrier scattering. Here, we use scanning tunnelling potentiometry to analyse the resistance of different kinds of defects at the surface of a (Bi0.53Sb0.47)2Te3 topological insulator thin film. The largest localized voltage drop we find to be located at domain boundaries in the topological insulator film, with a resistivity about four times higher than that of a step edge. Furthermore, we resolve resistivity dipoles located around nanoscale voids in the sample surface. The influence of such defects on the resistance of the topological surface state is analysed by means of a resistor network model. The effect resulting from the voids is found to be small compared to the other defects.
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Submitted 20 April, 2017;
originally announced April 2017.
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Surface Conductivity of Si(100) and Ge(100) Surfaces Determined from Four-Point Transport Measurements Using an Analytical N-Layer Conductance Model
Authors:
Sven Just,
Helmut Soltner,
Stefan Korte,
Vasily Cherepanov,
Bert Voigtländer
Abstract:
An analytical N-layer model for charge transport close to a surface is derived from the solution of Poisson's equation and used to describe distance-dependent electrical four-point measurements on the microscale. As the N-layer model comprises a surface channel, multiple intermediate layers and a semi-infinite bulk, it can be applied to semiconductors in combination with a calculation of the near-…
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An analytical N-layer model for charge transport close to a surface is derived from the solution of Poisson's equation and used to describe distance-dependent electrical four-point measurements on the microscale. As the N-layer model comprises a surface channel, multiple intermediate layers and a semi-infinite bulk, it can be applied to semiconductors in combination with a calculation of the near-surface band-bending to model very precisely the measured four-point resistance on the surface of a specific sample and to extract a value for the surface conductivity. For describing four-point measurements on sample geometries with mixed 2D-3D conduction channels often a very simple parallel-circuit model has so far been used in the literature, but the application of this model is limited, as there are already significant deviations, when it is compared to the lowest possible case of the N-layer model, i.e. the 3-layer model. Furthermore, the N-layer model is applied to published distance-dependent four-point resistance measurements obtained with a multi-tip scanning tunneling microscope (STM) on Germanium(100) and Silicon(100) with different bulk doping concentrations resulting in the determination of values for the surface conductivities of these materials.
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Submitted 7 October, 2016;
originally announced October 2016.
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Scanning tunneling potentiometry implemented into a multi-tip setup by software
Authors:
F. Lüpke,
S. Korte,
V. Cherepanov,
B. Voigtländer
Abstract:
We present a multi-tip scanning tunneling potentiometry technique that can be implemented into existing multi-tip scanning tunneling microscopes without hardware changes. The resulting setup allows flexible in situ contacting of samples under UHV conditions and subsequent measurement of the sample topography and local electric potential with resolution down to Å and μV, respectively. The performan…
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We present a multi-tip scanning tunneling potentiometry technique that can be implemented into existing multi-tip scanning tunneling microscopes without hardware changes. The resulting setup allows flexible in situ contacting of samples under UHV conditions and subsequent measurement of the sample topography and local electric potential with resolution down to Å and μV, respectively. The performance of the potentiometry feedback is demonstrated by thermovoltage measurements on the Ag/Si$(111)-(\sqrt3\times\sqrt3)\rm R30^{\circ}$ surface by resolving a standing wave pattern. Subsequently, the ability to map the local transport field as a result of a lateral current through the sample surface is shown on Ag/Si$(111)-(\sqrt3\times\sqrt3)\rm R30^{\circ}$ and Si$(111)-(7\times7)$ surfaces.
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Submitted 7 December, 2015; v1 submitted 31 August, 2015;
originally announced August 2015.
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Surface and Step Conductivities on Si(111) Surfaces
Authors:
Sven Just,
Marcus Blab,
Stefan Korte,
Vasily Cherepanov,
Helmut Soltner,
Bert Voigtländer
Abstract:
Four-point measurements using a multi-tip scanning tunneling microscope (STM) are carried out in order to determine surface and step conductivities on Si(111) surfaces. In a first step, distance-dependent four-point measurements in the linear configuration are used in combination with an analytical three-layer model for charge transport to disentangle the 2D surface conductivity from non-surface c…
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Four-point measurements using a multi-tip scanning tunneling microscope (STM) are carried out in order to determine surface and step conductivities on Si(111) surfaces. In a first step, distance-dependent four-point measurements in the linear configuration are used in combination with an analytical three-layer model for charge transport to disentangle the 2D surface conductivity from non-surface contributions. A termination of the Si(111) surface with either Bi or H results in the two limiting cases of a pure 2D or 3D conductance, respectively. In order to further disentangle the surface conductivity of the step-free surface from the contribution due to atomic steps, a square four-probe configuration is applied as function of the rotation angle. In total this combined approach leads to an atomic step conductivity of $σ_\mathrm{step} = (29 \pm 9)$ $\mathrmΩ^{-1} \mathrm{m}^{-1}$ and to a step-free surface conductivity of $σ_\mathrm{surf} = (9 \pm 2) \cdot 10^{-6}\,\mathrmΩ^{-1}/\square$ for the Si(111)-(7$\times$7) surface.
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Submitted 6 May, 2015;
originally announced May 2015.
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Etched graphene quantum dots on hexagonal boron nitride
Authors:
S. Engels,
A. Epping,
C. Volk,
S. Korte,
B. Voigtländer,
K. Watanabe,
T. Taniguchi,
S. Trellenkamp,
C. Stampfer
Abstract:
We report on the fabrication and characterization of etched graphene quantum dots (QDs) on hexagonal boron nitride (hBN) and SiO2 with different island diameters. We perform a statistical analysis of Coulomb peak spacings over a wide energy range. For graphene QDs on hBN, the standard deviation of the normalized peak spacing distribution decreases with increasing QD diameter, whereas for QDs on Si…
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We report on the fabrication and characterization of etched graphene quantum dots (QDs) on hexagonal boron nitride (hBN) and SiO2 with different island diameters. We perform a statistical analysis of Coulomb peak spacings over a wide energy range. For graphene QDs on hBN, the standard deviation of the normalized peak spacing distribution decreases with increasing QD diameter, whereas for QDs on SiO2 no diameter dependency is observed. In addition, QDs on hBN are more stable under the influence of perpendicular magnetic fields up to 9T. Both results indicate a substantially reduced substrate induced disorder potential in graphene QDs on hBN.
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Submitted 9 August, 2013;
originally announced August 2013.
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Step bunching during Si(001) homoepitaxy caused by the surface diffusion anisotropy
Authors:
J. Myslivecek,
C. Schelling,
F. Schaffler,
G. Springholz,
P. Smilauer,
J. Krug,
B. Voigtlander
Abstract:
Scanning tunneling microscopy experiments show that the unstable growth morphology observed during molecular beam homoepitaxy on slightly vicinal Si(001) surfaces consists of straight step bunches. The instability occurs under step- flow growth conditions and vanishes both during low-temperature island growth and at high temperatures. An instability with the same characteristics is observed in a…
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Scanning tunneling microscopy experiments show that the unstable growth morphology observed during molecular beam homoepitaxy on slightly vicinal Si(001) surfaces consists of straight step bunches. The instability occurs under step- flow growth conditions and vanishes both during low-temperature island growth and at high temperatures. An instability with the same characteristics is observed in a 2D Kinetic Monte Carlo model of growth with incorporated Si(001)- like diffusion anisotropy. This provides strong evidence that the diffusion anisotropy destabilizes growth on Si(001) and similar surfaces towards step bunching. This new instability mechanism is operational without any additional step edge barriers.
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Submitted 13 December, 2002;
originally announced December 2002.
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Magic Islands and Barriers to Attachment: A Si/Si(111)7x7 Growth Model
Authors:
J. Myslivecek,
T. Jarolimek,
P. Smilauer,
B. Voigtlaender,
M. Kaestner
Abstract:
Surface reconstructions can drastically modify growth kinetics during initial stages of epitaxial growth as well as during the process of surface equilibration after termination of growth. We investigate the effect of activation barriers hindering attachment of material to existing islands on the density and size distribution of islands in a model of homoepitaxial growth on Si(111)7x7 reconstruc…
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Surface reconstructions can drastically modify growth kinetics during initial stages of epitaxial growth as well as during the process of surface equilibration after termination of growth. We investigate the effect of activation barriers hindering attachment of material to existing islands on the density and size distribution of islands in a model of homoepitaxial growth on Si(111)7x7 reconstructed surface. An unusual distribution of island sizes peaked around "magic" sizes and a steep dependence of the island density on the growth rate are observed. "Magic" islands (of a different shape as compared to those obtained during growth) are observed also during surface equilibration.
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Submitted 6 May, 1999;
originally announced May 1999.
