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Showing 1–4 of 4 results for author: Stuckelberger, M

  1. arXiv:2409.00200  [pdf, other

    cond-mat.mtrl-sci

    Measurements of dislocations in 4H-SiC with rocking curve imaging

    Authors: Ahmar Khaliq, Felix Wittwer, Niklas Pyrlik, Giovanni Fevola, Svenja Patjens, Jackson Barp, Gero Falkenberg, Sven Hampel, Michael Stuckelberger, Jan Garrevoet, Dennis Bruckner, Peter Modregger

    Abstract: 4H Silicon Carbide (4H-SiC) combines many attractive properties such as a high carrier mobility, a wide bandgap, and a high thermal conductivity, making it an ideal candidate for high-power electronic devices. However, a primary challenge in utilizing 4H-SiC is the presence of defects in epitaxial layers, which can significantly degrade device performance. In this study, we have used X-ray transmi… ▽ More

    Submitted 30 August, 2024; originally announced September 2024.

  2. arXiv:2402.07155  [pdf

    cond-mat.mtrl-sci physics.app-ph

    Grain boundary strain localization in CdTe solar cell revealed by Scanning 3D X-ray diffraction microscopy

    Authors: A. Shukla, J. Wright, A. Henningsson, H. Stieglitz, E. Colegrove, L. Besley, C. Baur, S De Angelis, M. Stuckelberger, H. F. Poulsen, J. W. Andreasen

    Abstract: Cadmium Telluride (CdTe) solar cell technology is a promising candidate to help boost green energy production. However, impurities and structural defects are major barriers to improving the solar power conversion efficiency. Grain boundaries often act as aggregation sites for impurities, resulting in strain localization in areas of high diffusion. In this study, we demonstrate the use of scanning… ▽ More

    Submitted 11 February, 2024; originally announced February 2024.

  3. arXiv:2310.03409  [pdf

    cond-mat.mtrl-sci physics.acc-ph physics.app-ph

    Detection Sensitivity Limit of Hundreds of Atoms with X-Ray Fluorescence Microscopy

    Authors: Mateus G. Masteghin, Toussaint Gervais, Steven K. Clowes, David C. Cox, Veronika Zelyk, Ajith Pattammattel, Yong S. Chu, Nikola Kolev, Taylor Z. Stock, Neil Curson, Paul G. Evans, Michael Stuckelberger, Benedict N. Murdin

    Abstract: We report X-ray fluorescence (XRF) imaging of nanoscale inclusions of impurities for quantum technology. A very bright diffraction-limited focus of the X-ray beam produces very high sensitivity and resolution. We investigated gallium (Ga) dopants in silicon (Si) produced by a focused ion beam (FIB). These dopants might provide 3/2-spin qubits or p-type electrical contacts and quantum dots. We find… ▽ More

    Submitted 5 October, 2023; originally announced October 2023.

    Comments: 8 pages, 5 figures

  4. arXiv:2201.13264  [pdf, other

    cond-mat.mtrl-sci physics.app-ph

    X-ray diffraction with micrometer spatial resolution for highly absorbing samples

    Authors: P. Chakrabarti, A. Wildeis, M. Hartmann, R. Brandt, R. Döhrmann, G. Fevola, C. Ossig, M. E. Stuckelberger, J. Garrevoet, K. V. Falch, V. Galbierz, G. Falkenberg, P. Modregger

    Abstract: X-ray diffraction with high spatial resolution is commonly used to characterize (poly-)crystalline samples with, for example, respect to local strain, residual stress, grain boundaries and texture. However, the investigation of highly absorbing samples or the simultaneous assessment of high-Z materials by X-ray fluorescence have been limited due to the utilisation of low photon energies. Here, we… ▽ More

    Submitted 31 January, 2022; originally announced January 2022.