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Structural changes in Ge1-xSnx and Si1-x-yGeySnx thin films on SOI substrates treated by pulse laser annealing
Authors:
Oliver Steuer,
Daniel Schwarz,
Michael Oehme,
Florian Bärwolf,
Yu Cheng,
Fabian Ganss,
René Hübner,
René Heller,
Shengqiang Zhou,
Manfred Helm,
Gianaurelio Cuniberti,
Yordan M. Georgiev,
Slawomir Prucnal
Abstract:
Ge1-xSnx and Si1-x-yGeySnx alloys are promising materials for future opto- and nanoelectronics applications. These alloys enable effective band-gap engineering, broad adjustability of their lattice parameter, exhibit much higher carrier mobility than pure Si, and are compatible with the CMOS technology. Unfortunately, the equilibrium solid solubility of Sn in Si1-xGex is less than 1% and the pseud…
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Ge1-xSnx and Si1-x-yGeySnx alloys are promising materials for future opto- and nanoelectronics applications. These alloys enable effective band-gap engineering, broad adjustability of their lattice parameter, exhibit much higher carrier mobility than pure Si, and are compatible with the CMOS technology. Unfortunately, the equilibrium solid solubility of Sn in Si1-xGex is less than 1% and the pseudomorphic growth of Si1-x-yGeySnx on Ge or Si can cause in-plane compressive strain in the grown layer, degrading the superior properties of these alloys. Therefore, post-growth strain engineering by ultrafast non-equilibrium thermal treatments like pulse laser annealing (PLA) is needed to improve the layer quality. In this article, Ge0.94Sn0.06 and Si0.14Ge0.8Sn0.06 thin films grown on silicon-on-insulator substrates by molecular beam epitaxy were post growth thermally treated by PLA. The material is analyzed before and after the thermal treatments by transmission electron microscopy, X-ray diffraction (XRD), Rutherford backscattering spectrometry, secondary ion mass spectrometry, and Hall effect measurements. It is shown that after annealing, the material is single-crystalline with improved crystallinity than the as-grown layer. This is reflected in a significantly increased XRD reflection intensity, well-ordered atomic pillars, and increased active carrier concentrations up to 4x1019 cm-3.
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Submitted 13 June, 2024;
originally announced June 2024.
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Si1-x-yGeySnx alloy formation by Sn ion implantation and flash lamp annealing
Authors:
Oliver Steuer,
Michail Michailow,
René Hübner,
Krzysztof Pyszniak,
Marcin Turek,
Ulrich Kentsch,
Fabian Ganss,
Muhammad Moazzam Khan,
Lars Rebohle,
Shengqiang Zhou,
Joachim Knoch,
Manfred Helm,
Gianaurelio Cuniberti,
Yordan M. Georgiev,
Slawomir Prucnal
Abstract:
For many years, Si1-yGey alloys have been applied in the semiconductor industry due to the ability to adjust the performance of Si-based nanoelectronic devices. Following this alloying approach of group-IV semiconductors, adding tin (Sn) into the alloy appears as the obvious next step, which leads to additional possibilities for tailoring the material properties. Adding Sn enables effective band g…
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For many years, Si1-yGey alloys have been applied in the semiconductor industry due to the ability to adjust the performance of Si-based nanoelectronic devices. Following this alloying approach of group-IV semiconductors, adding tin (Sn) into the alloy appears as the obvious next step, which leads to additional possibilities for tailoring the material properties. Adding Sn enables effective band gap and strain engineering and can improve the carrier mobilities, which makes Si1-x-yGeySnx alloys promising candidates for future opto- and nanoelectronics applications. The bottom-up approach for epitaxial growth of Si1-x-yGeySnx, e.g., by chemical vapor deposition and molecular beam epitaxy, allows tuning the material properties in the growth direction only; the realization of local material modifications to generate lateral heterostructures with such a bottom-up approach is extremely elaborate, since it would require the use of lithography, etching, and either selective epitaxy or epitaxy and chemical-mechanical polishing giving rise to interface issues, non-planar substrates, etc. This article shows the possibility of fabricating Si1-x-yGeySnx alloys by Sn ion beam implantation into Si1-yGey layers followed by millisecond-range flash lamp annealing (FLA). The materials are investigated by Rutherford backscattering spectrometry, micro Raman spectroscopy, X-ray diffraction, and transmission electron microscopy. The fabrication approach was adapted to ultra-thin Si1-yGey layers on silicon-on-insulator substrates. The results show the fabrication of single-crystalline Si1-x-yGeySnx with up to 2.3 at.% incorporated Sn without any indication of Sn segregation after recrystallization via FLA. Finally, we exhibit the possibility of implanting Sn locally in ultra-thin Si1-yGey films by masking unstructured regions on the chip.
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Submitted 13 June, 2024;
originally announced June 2024.
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Aluminium substituted yttrium iron garnet thin films with reduced Curie temperature
Authors:
Daniel Scheffler,
Oliver Steuer,
Shengqiang Zhou,
Luise Siegl,
Sebastian T. B. Goennenwein,
Michaela Lammel
Abstract:
Magnetic garnets such as yttrium iron garnet (Y$_3$Fe$_5$O$_{12}$, YIG) are widely used in spintronic and magnonic devices. Their magnetic and magneto-optical properties can be modified over a wide range by tailoring their chemical composition. Here, we report the successful growth of Al-substituted yttrium iron garnet (YAlIG) thin films via radio frequency sputtering in combination with an ex sit…
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Magnetic garnets such as yttrium iron garnet (Y$_3$Fe$_5$O$_{12}$, YIG) are widely used in spintronic and magnonic devices. Their magnetic and magneto-optical properties can be modified over a wide range by tailoring their chemical composition. Here, we report the successful growth of Al-substituted yttrium iron garnet (YAlIG) thin films via radio frequency sputtering in combination with an ex situ annealing step. Upon selecting appropriate process parameters, we obtain highly crystalline YAlIG films with different Al$^{3+}$ substitution levels on both, single crystalline Y$_3$Al$_5$O$_{12}$ (YAG) and Gd$_3$Ga$_5$O$_{12}$ (GGG) substrates. With increasing Al$^{3+}$ substitution levels, we observe a reduction of the saturation magnetisation as well as a systematic decrease of the magnetic ordering temperature to values well below room temperature. YAlIG thin films thus provide an interesting material platform for spintronic and magnonic experiments in different magnetic phases.
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Submitted 6 July, 2023; v1 submitted 21 February, 2023;
originally announced February 2023.
