Showing 1–8 of 8 results for author: Muhowski, A J

Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects

Authors: W. Pan, K. R. Sapkota, P. Lu, A. J. Muhowski, W. M. Martinez, C. L. H. Sovinec, R. Reyna, J. P. Mendez, D. Mamaluy, S. D. Hawkins, J. F. Klem, L. S. L. Smith, D. A. Temple, Z. Enderson, Z. Jiang, E. Rossi

Abstract: In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero $^o$C. A sharp superconducting transition at $T \sim 1.3$ K is observed in these epi-Al films, and the critical magnetic field follows the BCS (Bardeen-Cooper-Schrieffer) model. We further show tha… ▽ More In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero $^o$C. A sharp superconducting transition at $T \sim 1.3$ K is observed in these epi-Al films, and the critical magnetic field follows the BCS (Bardeen-Cooper-Schrieffer) model. We further show that supercurrent states are achieved in Josephson junctions fabricated in the epi-Al/antimonide heterostructures with mobility $μ\sim 1.0 \times 10^6$ cm$^2$/Vs, making these heterostructures a promising platform for the exploration of Josephson junction effects for quantum microelectronics applications, and the realization of robust topological superconducting states that potentially allow the realization of intrinsically fault-tolerant qubits and quantum gates. △ Less

Submitted 8 October, 2024; originally announced October 2024.

Quantum Enhanced Josephson Junction Field-Effect Transistors for Logic Applications

Authors: W. Pan, A. J. Muhowski, W. M. Martinez, C. L. H. Sovinec, J. P. Mendez, D. Mamaluy, W. Yu, X. Shi, K. Sapkota, S. D. Hawkins, J. F. Klem

Abstract: Josephson junction field-effect transistors (JJFETs) have recently re-emerged as promising candidates for superconducting computing. For JJFETs to perform Boolean logic operations, the so-called gain factor $α_{R}$ must be larger than 1. In a conventional JJFET made with a classical channel material, due to a gradual dependence of superconducting critical current on the gate bias, $α_{R}$ is much… ▽ More Josephson junction field-effect transistors (JJFETs) have recently re-emerged as promising candidates for superconducting computing. For JJFETs to perform Boolean logic operations, the so-called gain factor $α_{R}$ must be larger than 1. In a conventional JJFET made with a classical channel material, due to a gradual dependence of superconducting critical current on the gate bias, $α_{R}$ is much smaller than 1. In this Letter, we propose a new device structure of quantum enhanced JJFETs in a zero-energy-gap InAs/GaSb heterostructure. We demonstrate that, due to an excitonic insulator quantum phase transition in this zero-gap heterostructure, the superconducting critical current displays a sharp transition as a function of gate bias, and the deduced gain factor $α_{R}$ ~ 0.06 is more than 50 times that (~ 0.001) reported in a classical JJFET. Further optimization may allow achieving a gain factor larger than 1 for logic applications. △ Less

Submitted 27 September, 2024; originally announced September 2024.

Journal ref: Materials Science and Engineering B 310 (2024) 117729

Buried Dirac points in Quantum Spin Hall Insulators: Implications for edge transport and Majorana Kramer Pairs

Authors: Joseph J. Cuozzo, Wenlong Yu, Xiaoyan Shi, Aaron J. Muhowski, Samuel D. Hawkins, John F. Klem, Enrico Rossi, Wei Pan

Abstract: For heterostructures formed by a quantum spin Hall insulator (QSHI) placed in proximity to a superconductor (SC), no external magnetic field is necessary to drive the system into a phase supporting topological superconductivity with Majorana zero energy states, making them very attractive for the realization of non-Abelian states and fault-tolerant qubits. Despite considerable work investigating Q… ▽ More For heterostructures formed by a quantum spin Hall insulator (QSHI) placed in proximity to a superconductor (SC), no external magnetic field is necessary to drive the system into a phase supporting topological superconductivity with Majorana zero energy states, making them very attractive for the realization of non-Abelian states and fault-tolerant qubits. Despite considerable work investigating QSHI edge states, there is still an open question about their resilience to large magnetic fields and the implication of such resilience for the formation of a quasi-1D topological superconducting state. In this work, we investigate the transport properties of helical edge states in a QSHI-SC junction formed by a InAs/GaSb (15nm/5nm) double quantum well and a superconducting tantalum (Ta) constriction. We observe a robust conductance plateau up to 2 T, signaling resilient edge state transport. Such resilience is consistent with the Dirac point for the edge states being buried in the bulk valence band. Using a modified Landauer-Buttiker analysis, we find that the conductance is consistent with 98% Andreev reflection probability owing to the high transparency of the InAs/GaSb-Ta interface. We further theoretically show that a buried Dirac point does not affect the robustness of the quasi-1D topological superconducting phase, and favors the hybridization of Majorana Kramer pairs and fermionic modes in the QSHI resulting in extended MKP states, highlighting the subtle role of buried Dirac points in probing MKPs. △ Less

Submitted 1 October, 2024; v1 submitted 27 September, 2024; originally announced September 2024.

Comments: 14 pages, 10 figures, and 2 tables

High operating temperature plasmonic infrared detectors

Authors: L. Nordin, A. J. Muhowski, D. Wasserman

Abstract: III-V semiconductor type-II superlattices (T2SLs) are a promising material system with the potential to significantly reduce the dark current of, and thus realize high-performance in, infrared photodetectors at elevated temperatures. However, T2SLs have struggled to meet the performance metrics set by the longstanding infrared detector material of choice, HgCdTe. Recently, epitaxial plasmonic dete… ▽ More III-V semiconductor type-II superlattices (T2SLs) are a promising material system with the potential to significantly reduce the dark current of, and thus realize high-performance in, infrared photodetectors at elevated temperatures. However, T2SLs have struggled to meet the performance metrics set by the longstanding infrared detector material of choice, HgCdTe. Recently, epitaxial plasmonic detector architectures have demonstrated T2SL detector performance comparable to HgCdTe in the 77 K - 195 K temperature range. Here we demonstrate a high operating temperature plasmonic T2SL detector architecture with high-performance operation at temperatures accessible with two-stage thermoelectric coolers. Specifically, we demonstrate long-wave infrared plasmonic detectors operating at temperatures as high as 230 K while maintaining dark currents below the "Rule 07" heuristic. At a detector operating temperature of 230 K, we realize 22.8% external quantum efficiency in a detector absorber only 372 nm thick ($\simλ_0 /25$) with peak specific detectivity of $2.29x10^{9}$ cm Hz$^{1/2}$ W$^{-1}$ at 9.6 $μ$m, well above commercial detectors at the same operating temperature. △ Less

Submitted 12 January, 2022; originally announced January 2022.

Comments: The following article has been submitted to Applied Physics Letters. After it is published, it will be found at https://aip.scitation.org/journal/apl

Low-threshold InP quantum dot and InGaP quantum well visible lasers on silicon (001)

Authors: Pankul Dhingra, Patrick Su, Brian D. Li, Ryan D. Hool, Aaron J. Muhowski, Mijung Kim, Daniel Wasserman, John Dallesasse, Minjoo Larry Lee

Abstract: Monolithically combining silicon nitride (SiNx) photonics technology with III-V active devices could open a broad range of on-chip applications spanning a wide wavelength range of ~400-4000 nm. With the development of nitride, arsenide, and antimonide lasers based on quantum well (QW) and quantum dot (QD) active regions, the wavelength palette of integrated III-V lasers on Si currently spans from… ▽ More Monolithically combining silicon nitride (SiNx) photonics technology with III-V active devices could open a broad range of on-chip applications spanning a wide wavelength range of ~400-4000 nm. With the development of nitride, arsenide, and antimonide lasers based on quantum well (QW) and quantum dot (QD) active regions, the wavelength palette of integrated III-V lasers on Si currently spans from 400 nm to 11 μm with a crucial gap in the red-wavelength regime of 630-750 nm. Here, we demonstrate the first red InGaP QW and far-red InP QD lasers monolithically grown on CMOS compatible Si (001) substrates with continuous-wave operation at room temperature. A low-threshold current density of 550 A/cm2 and 690 A/cm2 with emission at 680-730 nm was achieved for QW and QD lasers on Si, respectively. This work takes the first vital step towards integration of visible red lasers on Si allowing the utilization of integrated photonics for applications including biophotonic sensing, quantum computing, and near-eye displays. △ Less

Submitted 25 September, 2021; originally announced September 2021.

Comments: Journal article, 6 pages, 5 figures

Bright mid-infrared photoluminescence from high dislocation density epitaxial PbSe films on GaAs

Authors: Jarod Meyer, Aaron J. Muhowski, Leland J. Nordin, Eamonn T. Hughes, Brian B. Haidet, Daniel Wasserman, Kunal Mukherjee

Abstract: We report on photoluminescence in the 3-7 $μ$m mid-wave infrared (MWIR) range from sub-100 nm strained thin films of rocksalt PbSe(001) grown on GaAs(001) substrates by molecular beam epitaxy. These bare films, grown epitaxially at temperatures below 400 °C, luminesce brightly at room temperature and have minority carrier lifetimes as long as 172 ns. The relatively long lifetimes in PbSe thin film… ▽ More We report on photoluminescence in the 3-7 $μ$m mid-wave infrared (MWIR) range from sub-100 nm strained thin films of rocksalt PbSe(001) grown on GaAs(001) substrates by molecular beam epitaxy. These bare films, grown epitaxially at temperatures below 400 °C, luminesce brightly at room temperature and have minority carrier lifetimes as long as 172 ns. The relatively long lifetimes in PbSe thin films are achievable despite threading dislocation densities exceeding $10^9$ $cm^{-2}$ arising from island growth on the nearly 8% lattice- and crystal-structure-mismatched GaAs substrate. Using quasi-continuous-wave and time-resolved photoluminescence, we show Shockley-Read-Hall recombination is slow in our high dislocation density PbSe films at room temperature, a hallmark of defect tolerance. Power-dependent photoluminescence and high injection excess carrier lifetimes at room temperature suggest that degenerate Auger recombination limits the efficiency of our films, though the Auger recombination rates are significantly lower than equivalent, III-V bulk materials and even a bit slower than expectations for bulk PbSe. Consequently, the combined effects of defect tolerance and low Auger recombination rates yield an estimated peak internal quantum efficiency of roughly 30% at room temperature, unparalleled in the MWIR for a severely lattice-mismatched thin film. We anticipate substantial opportunities for improving performance by optimizing crystal growth as well as understanding Auger processes in thin films. These results highlight the unique opportunity to harness the unusual chemical bonding in PbSe and related IV-VI semiconductors for heterogeneously integrated mid-infrared light sources constrained by tight thermal budgets in new device designs. △ Less

Submitted 28 August, 2021; originally announced August 2021.

Comments: 24 pages, 6 figures

Journal ref: APL Materials 9, 111112 (2021)

Ultra-Thin All-Epitaxial Plasmonic Detectors

Authors: Leland Nordin, Priyanka Petluru, Abhilasha Kamboj, Aaron J. Muhowski, Daniel Wasserman

Abstract: We present an infrared photodetector leveraging an all-epitaxial device architecture consisting of a 'designer' plasmonic metal integrated with a quantum-engineered detector structure, all in a mature III-V semiconductor material system. Incident light is coupled into surface plasmon-polariton modes at the detector/'designer' metal interface, and the strong confinement of these modes allows for a… ▽ More We present an infrared photodetector leveraging an all-epitaxial device architecture consisting of a 'designer' plasmonic metal integrated with a quantum-engineered detector structure, all in a mature III-V semiconductor material system. Incident light is coupled into surface plasmon-polariton modes at the detector/'designer' metal interface, and the strong confinement of these modes allows for a sub-diffractive ($\sim λ_0 / 33$) detector absorber layer thickness, effectively decoupling the detector's absorption efficiency and dark current. We demonstrate high-performance detectors operating at non-cryogenic temperatures (T = 195 K), without sacrificing external quantum efficiency, and superior to well established and commercially-available detectors. This work provides a practical and scalable plasmonic optoelectronic device architecture with real world mid-infrared applications. △ Less

Submitted 14 October, 2021; v1 submitted 8 July, 2021; originally announced July 2021.

Enhanced Room Temperature Infrared LEDs using Monolithically Integrated Plasmonic Materials

Authors: Andrew F. Briggs, Leland Nordin, Aaron J. Muhowski, Evan Simmons, Pankul Dhingra, Minjoo L. Lee, Viktor A. Podolskiy, Daniel Wasserman, Seth R. Bank

Abstract: Remarkable systems have been reported recently using the polylithic integration of semiconductor optoelectronic devices and plasmonic materials exhibiting epsilon-near-zero (ENZ) and negative permittivity. In traditional noble metals, the ENZ and plasmonic response is achieved near their plasma frequencies, limiting plasmonic optoelectronic device design flexibility. Here, we leverage an all-epita… ▽ More Remarkable systems have been reported recently using the polylithic integration of semiconductor optoelectronic devices and plasmonic materials exhibiting epsilon-near-zero (ENZ) and negative permittivity. In traditional noble metals, the ENZ and plasmonic response is achieved near their plasma frequencies, limiting plasmonic optoelectronic device design flexibility. Here, we leverage an all-epitaxial approach to monolithically and seamlessly integrate designer plasmonic materials into a quantum dot light emitting diode (LED), leading to a ~5.6 x enhancement over an otherwise identical non-plasmonic control sample. Devices exhibited optical powers comparable, and temperature performance far superior, to commercially-available devices. △ Less

Submitted 25 August, 2020; v1 submitted 6 May, 2020; originally announced May 2020.

Comments: Journal letter, four pages, five figures